us6983892b2 - gas distribution showerhead for

Conair Corporation

Conair has you covered from head-to-toe. Whether at home or on the go – we'll keep you looking and feeling great wherever you may be! Enter MERRY18 at checkout* *Offer valid from 11/23/18 – 12/14/18. Enter promo code MERRY18 at checkout to receive savings. at checkout to receive savings.

Hamilton Gas Products

Hamilton Gas Products Ltd - Everything for the Gas Installer more! We are one of the United Kingdom Ireland's leading suppliers of gas fittings and gas equipment and have been trading for 50 years. We have a wide range of LPG and natural gas products and appliances available to retailers and the gas/plumbing and heating trade.

Uniformity study in large

Large area plasma-enhanced chemical vapor deposition of thin films such as silicon nitride or amorphous silicon is widely used for thin film transistor fabrication in the flat panel display industry. A numerical three-dimensional model to calculate the deposition uniformity over the whole electrode surface for rf rectangular showerhead reactors powered at 13.56 MHz is presented. The simulation

Hamilton Gas Products

Hamilton Gas Products Ltd - Everything for the Gas Installer more! We are one of the United Kingdom Ireland's leading suppliers of gas fittings and gas equipment and have been trading for 50 years. We have a wide range of LPG and natural gas products and appliances available to retailers and the gas/plumbing and heating trade.

2D fluid model analysis for the effect of 3D gas flow on a

Velocity distribution inside the showerhead hole Velocity magnitude [m/s] r( m) z(m) 00 .050 .1 0.15-0.04-0.02 0 0.02 T: g 4004 40 4805 20 5606 00 6406 80 7207 60 800 Dielectric block RF powered electrode (Showerhead) Centerline of reactor Gas temperature

2D fluid model analysis for the effect of 3D gas flow on a

2016/4/6The gas flow passing through a single showerhead hole was computationally analyzed, and the velocity distribution is depicted in the inset of figure 1. To achieve a self-consistent model for such a CCP deposition reactor, four major physical phenomena are considered: fluid flow, thermal energy, homogeneous and heterogeneous chemical reactions, and RF discharge.

Gas distribution showerhead

Gas distribution showerhead 308 is positioned above wafer 302 and is separated from wafer 302 by gap Y′. [0045] Gas distribution showerhead 308 comprises process gas inlet 310 in fluid communication with blocker plate 312 having apertures 314316 having a .

Gas distribution showerhead for semiconductor

We have developed a gas distribution showerhead assembly, for use in a semiconductor processing chamber, which can be easily cleaned, with minimal chamber downtime. The gas distribution showerhead assembly includes an electrode having openings therethrough, and a gas distribution plate which includes a plurality of through-holes for delivering processing gases into the

US Patent Application for GAS DISTRIBUTION

The gas distribution showerhead assembly of claim 1, wherein the gas distribution plate has a thickness of approximately 0.038 inches to 0.050 inches. 10. The gas distribution showerhead assembly of claim 5, wherein two of the second set of through-holes are aligned with each through-hole of the first set of through-holes.

PART I INTRODUCTION TO WATER SUPPLY

gas, the water utilities deliver their product to the home, which requires a network of distribution pipes to service each , but unlike the other utilities these are stand alone local or regional networks, rather than integrated national supply networks.

EmerALD XP ALD

The EmerALD reactor chamber uses a showerhead-process gas distribution method to assure uniform gas delivery to the wafer surface. EmerALD also has a remote plasma chamber clean capability which for many processes allows the option of maintaining chamber performance for longer periods between chamber cleans resulting in higher uptime.

Gas distribution showerhead

A gas distribution showerhead is designed to allow deposition of uniformly thick films over a wide range of showerhead-to-wafer spacings. In accordance with one embodiment of the present invention, the number, width, and/or depth of orifices inlet to the faceplate are reduced in order to increase flow resistance and thereby elevate pressure upstream of the faceplate.

Why Does My Water Smell Like Sulfur? (4 Ways to Fix It)

Why Does My Water Smell Like Sulfur? it's annoying to turn on your tap water only to notice the smell of sulfur or a strong rotten egg smell. If you've been there you know the kind of nuisance this unpleasant smell causes. So, why does your water smell like sulfur?

Amazon: shower faucet

The best shower faucet turns the ordinary shower into a luxurious experience. Our evaluation focused on pressure, self-cleaning ability, handhelds, temperature/flow control, and warranty. We also looked into auxiliary benefits such as aesthetics and water efficiency.

Micro/Nano Fabrication and Cleanroom

Plasma-therm 790 MF is a stand-alone Reactive Ion Etching (RIE) system with showerhead gas distribution and water cooled RF platen. The chamber could reach a base pressure in the 3x10-5Torr range, and it can be operated in the pressure range of 10mTorr to 100mTorr.

DEEMED SAVINGS TECHNICAL ASSUMPTIONS Product: Energy Efficient Showerhead

showerhead we will take credit equal to 11% of the electric savings and 89% of the gas savings. Transmission Distribution Loss Factor = 7.69 %, the percentage loss of electricity as it flows from the power plant to the customer, calculated using factors from Enhanced DSM Filing - SRD-2

Gas distribution showerhead for semiconductor

We have developed a gas distribution showerhead assembly, for use in a semiconductor processing chamber, which can be easily cleaned, with minimal chamber downtime. The gas distribution showerhead assembly includes an electrode having openings therethrough, and a gas distribution plate which includes a plurality of through-holes for delivering processing gases into the

A gas flow uniformity study in large

Gas flow uniformity in large-area reactors where P is the pressure inside the reactor, η is the gas viscosity, V 0 is the downward gas velocity at the showerhead and is related to the total flow rate Q by Q = V 0PLxLy. For silane at 200 C, η = 1.210−5 kg m−1 s−1 and for the

Anh N. Nguyen Inventions, Patents and Patent Applications

The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.

Eyewash Station and Emergency Shower Requirements

Q: Why is weekly activation for plumbed emergency eyewash and shower equipment suggested? A: The intent of weekly activation is to ensure that there is flushing fluid supply at the head of the device, to clear the supply line of any sediment build-up that could prevent the flushing fluid from being delivered to the head of the device, and to minimize microbial contamination due to stagnant water.

Uniformity control of the deposition rate profile of a

2018/3/19The modulation of the gas velocity distribution results in a noticeable change in the density distributions of neutral molecules such as SiH 4, SiH 3, H, SiH 2, and Si 2 H 6, especially in the vicinity of the electrode edge.

Energy Ombudsman: Here to help with gas electricity

Gas and electricity bills. Problems that arise as a result of switching energy supplier. The way an energy product or service has been sold, including door step sales. The supply of energy to a home. Micro generation and Feed-in-Tariffs. Problems relating to the

Amazon : Coleman 5

Don't miss a shower – even when you're camping – with the Coleman 5-Gallon Solar Shower. The reservoir holds up to 5 gallons of water—enough for multiple showers. It's constructed of heat-locking material that warms the water when it's left in the sun, even on

A gas flow uniformity study in large

Gas flow uniformity in large-area reactors where P is the pressure inside the reactor, η is the gas viscosity, V 0 is the downward gas velocity at the showerhead and is related to the total flow rate Q by Q = V 0PLxLy. For silane at 200 C, η = 1.210−5 kg m−1 s−1 and for the

Apparatus for uniform gas and radiant heat dispersion

A gas distribution showerhead for uniformly distributing gas and undistorted radiant heat in an RTP chamber. A gas passageway exists within the showerhead and is suitable for connection to a source of gas. The gas passageway terminates in a plurality of gas ports

Methane Gas and Its Removal from Water Wells

Production-grade methane is marked by a pungent odor from mercaptan; a chemical odorant added to methane by a gas company before distribution to help in leak detection. Methane gas alone is not toxic and does not cause health problems in drinking water but at elevated concentrations it can escape quickly from water causing an explosive hazard in poorly ventilated or confined areas.

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